In the case ofSnO2 sputter conditio

In the case of
SnO2 sputter condition of ‘150W, 100
C, 5.0 Pa’,
the photocatalytic efficiency of the TiO2/SnO2
system was as high as that of TiO2 film even when
the thickness of the SnO2 is up to 25 nm; IPA
degradation rate of 200nm thick TiO2 film is
7.8 ppm/min.

Results (English) 2:

在
SnO2的溅射条件的
150W，100 C，5 Pa的，
的TiO2／SnO2
系统，即使
TiO2薄膜的SnO2厚度达到25 nm的高的光催化效率；200nm厚的TiO2薄膜的降解率
IPA
7.8页/分钟。